R&D Engineer, Sr II

Synopsys, Inc. California, MD
Job Description and Requirements

The Synopsys Proteus Modeling research and development team is responsible for the design, development and productization of full-chip software tools for modeling optical proximity effects, mask topography effects and wafer topography effects in DUV and EUV lithography processes. Applications include optical proximity correction (OPC), Lithography Rule Checking (LRC), Resolution Enhancement Techniques (RET), Inverse Lithography Technology (ILT) and Design for Manufacturing (DFM) tools. The successful candidate will work closely with the rest of the modeling R&D team with the responsibility of improving the software architecture, identifying performance opportunities in the modeling engine, optimizing algorithms and adapting code for high-performance server architectures and compiler technologies. May interact with Proteus customers for the purpose of gathering requirements, or resolving software issues encountered with customer data or flows.

MS or PhD in CS, EE, physics, applied math or other engineering fields with a minimum of 3 years software development is required. Development and debugging experiences with C/C++, and a strong background in data structures and algorithms, are required. Knowledge of STL, BOOST, Python, and distributed processing are desirable. A strong desire to learn and explore new technologies and demonstrates good analysis and problem-solving skills is a must. The successful candidate must have good communication skill and the ability to work both as part of a team and as an individual contributor.